New XPS instrument PHI GENESIS released!

XPS and HAXPES combined in one multi-technique platform

ULVAC-PHI Incorporated (headquartered in Chigasaki, Kanagawa Prefecture, Japan) has launched the PHI GENESIS, an automated and multifunctional X-ray photoelectron spectrometer (XPS) or electron spectroscopy for chemical analysis (ESCA).

The PHI GENESIS XPS is a new product that combines PHI surface analysers with expansion capabilities, giving you mind-blowing basic performance in a compact package.

What are the market needs?

Advanced materials such as solid-state batteries, advanced semiconductors and artificial photosynthesis are complex combinations of materials whose research and development require rapid optimisation of the performance of each material as well as the combinations of materials. There is a growing need for powerful and highly functional surface and interface analysis that can significantly accelerate this research and development.

With the PHI GENESIS, we offer you a new surface analysis system that provides not only extremely high basic performance but also a high level of automation to meet your individual requirements.

The best solution for you: The new scanning X-ray photoelectron spectrometer (XPS) PHI GENESIS from ULVAC-PHI.


Fully automated Multi-tech XPS / HAXPES

  • Easy Operation & Multi-technique Options
  • High Performance Large & Micro Area XPS Analysis
  • High Speed & Non-Destructive Depth Profiling
  • Fully Automated with Sample Parking
  • Hard X-ray Cr Kα source for HAXPES
  • Comprehensive solution for batteries, semiconductors, organic devices and other applications

Your advantages

Simple operation
Intuitive user interface (UI)

PHI GENESIS offers you a simple, intuitive and easy-to-use user interface experience

Multi-technology options
No compromise solution

With powerful XPS, HAXPES, UPS, LEIPS, REELS, AES and a variety of other options, we meet all your surface analysis needs

High throughput large area analysis – enhanced scanning X-ray imaging (SXI)

The unsurpassed 5 µm X-ray beam with a small spot opens up new possibilities for micro-XPS applications

High-throughput depth profiling – High-performance depth profiling

Sample: Au ion-implanted Si wafer with up to 10 ppm Au detected during depth profiling

Non-destructive depth profiling – Sputter-free depth probing

By using a high-energy hard X-ray source, we enable you to obtain information from a greater depth than with conventional soft X-ray XPS

What challenges do you want to solve?

Application areas

  • Semiconductors
  • Batteries
  • Organic devices
  • Catalysts
  • Quantum dots
  • Nanoparticles
  • Bio and life science materials
  • Polymers
  • Ceramics
  • Metals
  • and other solid materials and devices

Easy operation

PHI GENESIS offers a new user interface that provides intuitive, simple and fully automated operation of the high-performance instrument.

This interface allows access to all necessary functions for setting up routine and advanced multi-technique acquisitions within a single screen. Features such as navigation using the intro photo and 100% accurate positioning from X-ray-induced secondary electron images (SXI) are retained.

Multi-technique options

PHI GENESIS offers automated analysis on the same surface using multiple techniques covering the entire energy range – from conduction band with LEIPS to core-level excitation with HAXPES. PHI GENESIS thus offers unprecedented added value not found in conventional XPS instruments.